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Deposition and characterization of HfO2 high k dielectric films
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- Journal:
- Journal of Materials Research / Volume 19 / Issue 6 / June 2004
- Published online by Cambridge University Press:
- 03 March 2011, pp. 1775-1782
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- June 2004
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Tunable Workfunction with TaN Metal Gate on HfO2-HfxSiyO Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D4.3
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- 2004
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A Low Temperature, Solution Phase Synthesis of III-V Semiconductor Nanocrystals
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- Journal:
- MRS Online Proceedings Library Archive / Volume 351 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 293
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- 1994
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The Chemical Vapor Deposoitin of Pure Nickel and Nickel Boride Thin Films from Borane Cluster Compounds
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- Journal:
- MRS Online Proceedings Library Archive / Volume 250 / 1991
- Published online by Cambridge University Press:
- 15 February 2011, 311
- Print publication:
- 1991
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The Deposition of Nickel Boride Thin Films by Borane and Metallaborane Cluster Compounds
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- Journal:
- MRS Online Proceedings Library Archive / Volume 204 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 439
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- 1990
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The Deposition of Aluminum and Aluminum Boride Thin Films by Aluminaborane Cluster Compounds
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- Journal:
- MRS Online Proceedings Library Archive / Volume 204 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 397
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- 1990
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